Method of manufacturing solar cell
US10050170B2 · kind B2 · utility
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3References
18Claims
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Key dates
| Filing date | Jan 27, 2017 |
| Grant date | Aug 14, 2018 |
| Priority date | — |
| Expiry date | Jan 27, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A method of manufacturing a solar cell can include forming a silicon oxide film on a semiconductor substrate and successively exposing the silicon oxide film to a temperature in a range of 570° C. to 700° C. to anneal the silicon oxide film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.