Methods for forming an electrode device with reduced impedance
US10052476B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 16, 2015 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Nov 30, 2035 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N1/0534
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Improved low-cost, highly reliable methods for increasing the electrochemical surface area of neural electrodes are described. A mono-layer of polymeric nanospheres is first deposited on a metallization supported on a dielectric substrate. The nanospheres self-assemble into generally repeating lattice forms with interstitial space between them. Then, the geometric surface area of the metallization material is increased by either selectively etching part-way into its depth at the interstitial space between adjacent nanospheres. Another technique is to deposit addition metallization material into the interstitial space. The result is undulation surface features provided on the exposed surface of the metallization. This helps improve the electrochemical surface area when the treated metallizations are fabricated into electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.