Method of forming a self-cleaning film system
US10052622B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2017 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Mar 3, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2518/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of forming a self-cleaning film system includes depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a bonded portion disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.