Photoresist stripping using intelligent liquids
US10053655B2 · kind B2 · utility
0Cited by
2References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 13, 2014 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Oct 13, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention present describes novel cleaning agents based on a multiphase system, the use thereof for removing photoresist coatings from surfaces, and a method for removing photoresist coatings from surfaces. The multiphase system according to the invention is used in particular for removing coatings, photoresist coatings, polymer layers, dirt layers, insulation layers, and metal layers from surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.