Overlapping pattern projector
US10054430B2 · kind B2 · utility
8Cited by
15References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 1, 2016 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Mar 7, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/02253
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.