Focusing state measuring apparatus
US10054515B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 3, 2017 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | May 3, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B7/32
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A focusing state measuring apparatus for measuring a focusing state of a working apparatus with respect to a target object so as to perform work includes: a base plate installed in the working apparatus performing work on the target object and spaced apart from the target object; a first line beam generation unit provided on one side of the base plate and configured to irradiate a first line beam toward the target object; and a second line beam generation unit provided on one side of the base plate so as to be spaced apart from the first line beam generation unit in a first direction and configured to irradiate a second line beam toward the target object. The focusing state of the working apparatus with respect to the target object is determined according to states of the first line beam and the second line beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.