Fluorine free photopatternable phenol functional group containing polymer compositions
US10054854B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Sep 27, 2016 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Sep 27, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2800/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.