Multi-resolution localization system
US10059003B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2016 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Jul 17, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S901/09
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
In one aspect, a method is described. The method may include providing an end effector tool of a robotic device configured to perform a task on a work surface within a worksite coordinate frame. The method may further include providing first location data indicating a first location of the end effector tool with respect to the work surface, providing second location data indicating a second location of the end effector tool within the worksite coordinate frame, and providing third location data indicating a third location of the end effector tool within the worksite coordinate frame. The method may further include tracking the location of the end effector tool based on the first, second, and third location data, and, based on the tracked location of the tool, instructing the robotic device to manipulate the end effector tool to perform a task on the work surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.