Illumination system and projection apparatus having reflection cover
US10061188B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2017 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Apr 7, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination system including at least one light source, a reflection cover, a wavelength conversion element, and a filter element is provided. A focal point of the reflection cover is disposed on an extension line of a transmission path of an excitation beam provided by the light source, and an opening of the reflection cover is adjacent to the focal point. The wavelength conversion element penetrates through the opening, and has a light-action region. The light-action region is disposed on the transmission path of the excitation beam, and converts the excitation beam into a conversion beam. The reflection cover is disposed on a transmission path of the conversion beam. The filter element is disposed on a transmission path of the conversion beam from the reflection cover. The conversion beam from the reflection cover is obliquely incident to the filter element, and the filter element filters the conversion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.