Method of forming magnetic patterns, and method of manufacturing magnetic memory devices
US10062837B2 · kind B2 · utility
38Cited by
4References
20Claims
0Family size
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Key dates
| Filing date | Sep 8, 2016 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Sep 16, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/85
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.