Pattern drawing apparatus and pattern drawing method
US10067429B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 9, 2016 |
| Grant date | Sep 4, 2018 |
| Priority date | — |
| Expiry date | Aug 9, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern drawing apparatus includes a first image-pickup device for reading an alignment mark and reading a first pattern image for detecting a positional shift, a second image-pickup device for reading the first pattern image and reading a second pattern image for detecting a positional shift drawn by an irradiation light beam from the optical head while carrying out a relative movement between the table and the optical head, and a positional shift detection unit for obtaining a first coordinate difference between a center of a visual field of the first image-pickup device and a center of the first pattern based on a read image by the first image-pickup device and obtaining a second coordinate difference between the center of the first pattern and a specific position of the second pattern based on a read image by the second image-pickup device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.