Patent · US Active

Lasing-gas mixture for excimer laser

US10069273B1 · kind B1 · utility

0Cited by

8References

12Claims

0Family size

Assignee

Coherent LaserSystems GmbH & Co. KG · DE

Inventors

Igor Bragin · Göttingen, DE
Oleg Melnikov · Oebisfelde, DE
Timur V. Misyuryaev · Oettingen, DE

Key dates

Filing date	Mar 2, 2017
Grant date	Sep 4, 2018
Priority date	—
Expiry date	Mar 2, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/2253
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A xenon chloride (XeCl) excimer laser includes a lasing-gas mixture including a buffer gas, a noble gas, a halogen-donating gas, and deuterium. The deuterium is present in a concentration greater than about 10 parts-per-million.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.