Patent · US Active

Fast hall effect measurement system

US10073151B2 · kind B2 · utility

3Cited by
4References
31Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 12, 2017
Grant dateSep 11, 2018
Priority date
Expiry dateOct 12, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R33/072
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and system for measuring Hall effect in a material includes measuring a voltage in two test states, each state alternating the direction and orientation of a current applied across the material or the voltage measured across the material relative to a magnetic field in each state. According to an embodiment, the frequency of measurement at each state differs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.