System and method for applying orthogonal limitations to light beams using microelectromechanical systems
US10073417B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2015 |
| Grant date | Sep 11, 2018 |
| Priority date | — |
| Expiry date | Sep 24, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2225/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for generating a light beam having a plurality of orthogonal function modes includes a light source for generating a plane wave light beam. A MicroElectroMechanical (MEM) system including an array of micro-mirrors for generating the light beam having the plurality of orthogonal function modes applied thereto responsive to the plane wave light beam and control signals for controlling the array of micro-mirrors. A controller generates the control signals to control a position of each of a plurality of micro-mirrors of the array of micro-mirrors. The controller controls the position of the micro-mirrors to generate a plurality of holograms for applying the plurality of orbital angular momentum modes to the plane wave light beam responsive to the control signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.