Developer free positive tone lithography by thermal direct write
US10074544B2 · kind B2 · utility
0Cited by
4References
33Claims
0Family size
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Key dates
| Filing date | Apr 18, 2014 |
| Grant date | Sep 11, 2018 |
| Priority date | — |
| Expiry date | Mar 6, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.