Ultraviolet light-generating target and method for manufacturing the same, and electron beam-excited ultraviolet light source
US10079141B2 · kind B2 · utility
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Key dates
| Filing date | Dec 26, 2017 |
| Grant date | Sep 18, 2018 |
| Priority date | — |
| Expiry date | Dec 26, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J63/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ultraviolet light-generating target comprising a substrate transmitting ultraviolet light; and a light-emitting layer provided on the substrate and emitting ultraviolet light in response to an electron beam, wherein the light-emitting layer is an amorphous layer formed of Al2O3 doped with Sc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.