Solar cell fabrication using laser patterning of ion-implanted etch-resistant layers and the resulting solar cells
US10079319B2 · kind B2 · utility
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Key dates
| Filing date | Dec 16, 2015 |
| Grant date | Sep 18, 2018 |
| Priority date | — |
| Expiry date | Jun 23, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
Solar cell fabrication using laser patterning of ion-implanted etch-resistant layers, and the resulting solar cells, are described. In an example, a back contact solar cell includes a maximum concentration of the approximately Gaussian distribution of P-type dopants approximately in the center of each of segmented P-type emitter regions between first and second sides of each of the segmented P-type emitter regions.
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