Patent · US Active

Process of forming transparent conductive coatings with sintering additives

US10081733B2 · kind B2 · utility

0Cited by
5References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 30, 2015
Grant dateSep 25, 2018
Priority date
Expiry dateJan 25, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01B1/22
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process is disclosed for the delayed sintering of metal nanoparticles in a self-assembled transparent conductive coating by incorporating a sintering additive into the water phase of the emulsion used to form the coating. The sintering additive reduces the standard reduction potential of the metal ion of the metal forming the nanoparticles by an amount greater than 0.1V but less than the full reduction potential of the metal ion. Emulsion compositions used in the process are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.