Exhaust gas purification device
US10086363B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2016 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Oct 5, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The exhaust gas purification device includes: a substrate of wall flow structure having inlet cells, outlet cells and a porous partition wall; and a catalyst layer provided in at least part of internal pores of the partition wall and held on the surface of the internal pores. The relationship between an average filling factor A of the catalyst layer held in pores having a pore diameter of 5 μm to less than 10 μm, an average filling factor B of the catalyst layer held in pores having a pore diameter of 10 μm to less than 20 μm and an average filling factor C of the catalyst layer held in pores having a pore diameter of 20 μm to less than 30 μm, among the internal pores of the partition wall 16 in which the catalyst layer is held, satisfies the following expression: A<B<C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.