Optical measurement element for alignment in wafer-level testing and method for aligning an optical probe using the same
US10088299B2 · kind B2 · utility
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Key dates
| Filing date | Jul 5, 2017 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Jul 5, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/4225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment optical measurement element includes a grating coupler, and a reflector coupled to the grating coupler. The alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction into a first diffracted light to propagate the first diffracted light as a first propagating light in a second direction, the reflector reflects the first propagating light into a second propagating light in a third direction opposite to the second direction; and the grating coupler diffracts the second propagating light into a second diffracted light to emit the second diffracted light as an emitted light in a fourth direction opposite to the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.