Method for manufacturing array substrate, array substrate and display device
US10090338B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 4, 2016 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Aug 4, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136231
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.