Via etch method for back contact multijunction solar cells
US10090420B2 · kind B2 · utility
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34References
17Claims
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Key dates
| Filing date | Oct 24, 2016 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Oct 24, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/548
Abstract
This disclosure relates to semiconductor devices and methods for fabricating semiconductor devices. Particularly, the disclosure relates to back-contact-only multijunction solar cells and the process flows for making such solar cells, including a wet etch process that removes semiconductor materials non-selectively without major differences in etch rates between heteroepitaxial III-V semiconductor layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.