Patent · US Active

Method of forming silicon

US10090513B2 · kind B2 · utility

23Cited by
34References
33Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 3, 2013
Grant dateOct 2, 2018
Priority date
Expiry dateOct 7, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/10
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of forming a particulate material comprising silicon, the method comprising the step of reducing a particulate starting material comprising silica-containing particles having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns, or reducing a particulate starting material comprising silica-containing particles comprising a plurality of elongate structural elements, each elongate structural element having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.