Production method for a detection apparatus and detection apparatuses
US10094725B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2017 |
| Grant date | Oct 9, 2018 |
| Priority date | — |
| Expiry date | Jul 2, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/00014
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A production method for a detection apparatus includes: forming at least one sensitive region having at least one exposed sensing area on and/or in a semiconductor substrate, encapsulating at least one part of the semiconductor substrate so that the at least one sensing area is sealed in an air-, liquid- and/or particle-tight fashion from an external environment, and forming at least one opening so that at least one air, liquid and/or particle access from the external environment to the at least one sensing area is created, wherein before forming the at least one opening, at least one first test and/or calibration measurement is performed, for which at least one sensor signal of the at least one sensitive region having the at least one sensing area sealed in an air-, liquid- and/or particle-tight fashion is determined as at least one first test and/or calibration signal. Also described are related detection apparatuses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.