Anti-reflective coating for sapphire
US10099247B2 · kind B2 · utility
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2References
19Claims
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Key dates
| Filing date | Jun 15, 2016 |
| Grant date | Oct 16, 2018 |
| Priority date | — |
| Expiry date | Jun 15, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A coated substrate includes a sapphire substrate and an anti-reflective coating comprising a silicon-based material, wherein the anti-reflective coating has refractive index of 1.23 to 1.45 and a Mohs hardness of at least 4. A method of coating a sapphire substrate with an anti-reflective coating includes applying a liquid formulation to a sapphire substrate to form a coated substrate, and curing the coated substrate at a temperature of at least 500° C. to form an anti-reflective layer on the sapphire substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.