High purity tungsten hexachloride and method for making same
US10100406B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2016 |
| Grant date | Oct 16, 2018 |
| Priority date | — |
| Expiry date | Sep 12, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/80
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Condensable metal halide materials, such as but not limited to tungsten chloride (WCl6), can be used to deposit metal films or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity compositions comprising condensable materials and methods to purify condensable materials. In one aspect, there is provided a composition comprising: tungsten hexachloride which is substantially free of at least one impurity and wherein the tungsten hexachloride comprises at least 90%, preferably 95% and more preferably 99% by weight or greater of a β-WCl6 and 5% by weight or less of the α-WCl6 as measured by X-ray diffraction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.