Methods to control adhesiveness using topography
US10101149B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2017 |
| Grant date | Oct 16, 2018 |
| Priority date | — |
| Expiry date | Apr 12, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B5/0025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems are disclosed for analyzing the adhesiveness of enamel frits using topography. One method includes analyzing a topography of a defined area of an enamel frit surface having a plurality of peaks and determining a topographical parameter of the defined area based on peak shape and/or density. The determined topographical parameter may be compared to a threshold value. The method may then include applying an adhesive to the enamel frit and bonding the enamel frit to a substrate if the determined topographical parameter is below the threshold value. The analysis of the topography may be performed using a non-contact profilometer, such as an optical profilometer. In one embodiment, the topographical parameter may be developed interfacial roughness (Sdr). The method may be integrated into a manufacturing/assembly line for vehicle glass components, such as windshields or side windows.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.