Patent · US Active

Device and method for generating vortex beam generation

US10101505B2 · kind B2 · utility

1Cited by

0References

10Claims

0Family size

Assignee

Huawei Technologies Co., Ltd. · CN

Inventors

Jian Wang · Beijing, CN
Jing Du · 红钢城街道, CN
Jifang He · 红钢城街道, CN

Key dates

Filing date	Apr 7, 2017
Grant date	Oct 16, 2018
Priority date	—
Expiry date	May 6, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A vortex beam device includes: a metal reflector, a low refractive index layer, and multiple elliptical dielectric elements. The low refractive index layer located on the metal reflector. The multiple elliptical dielectric elements are embedded in the low refractive index layer and arranged in an array, major axes of the multiple elliptical dielectric elements are parallel or coincident. The multiple elliptical dielectric elements have a same thickness. A thickness of the low refractive index layer is greater than a thickness of the elliptical dielectric element. An outer surface of each elliptical dielectric element is flush with an outer surface of the low refractive index layer. A refractive index of the low refractive index layer is less than a refractive index of the elliptical dielectric element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.