Apparatus for forming an optical pattern
US10101508B2 · kind B2 · utility
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3References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 2, 2015 |
| Grant date | Oct 16, 2018 |
| Priority date | — |
| Expiry date | Nov 2, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0284
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for forming an optical pattern includes a vacuum chamber, a mount on which a substrate to be prepared using a mask is to be supported, a diffusion unit adjacent the mask, spaced apart from the mask by a preset interval, and facing the mask, the diffusion unit to diffuse light incident thereon as uniform surface light and transmit the uniform surface light to the mask, and a light source unit spaced in a lateral direction from the diffusion unit, the light source unit to generate light to be incident on the diffusion unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.