Mirror, in particular collector mirror for microlithography
US10101569B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 22, 2017 |
| Grant date | Oct 16, 2018 |
| Priority date | — |
| Expiry date | Jun 29, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/064
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A collector mirror for an EUV microlithography system. The collector mirror includes an optical grating having an optically effective mirror surface, which reflects electromagnetic used rays in an EUV spectral range emanating from a first focal point and focuses them onto a second focal point. The first and second focal points lie on a side of the optical grating facing the mirror surface and define an optical axis. The optical grating is configured, in interaction with a stop arranged at the second focal point, to allow the used rays to pass through the stop and to block electromagnetic remaining rays in a remaining spectral range different than the EUV spectral range. The optical grating includes a blazed grating composed of a plurality of mirror facets, each having a facet surface. The facet surfaces form the mirror surface of the blazed grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.