Patent · US Active

Illumination unit and device for lithographic exposure

US10101665B2 · kind B2 · utility

1Cited by

8References

9Claims

0Family size

Assignees

Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE
Friedrich-Schiller-Universitat Jena · DE

Inventors

Uwe Detlef Zeitner · Weimar, DE
Tina Weichelt · Jena, DE
Yannick Bourgin · Großgölitz, DE

Key dates

Filing date	Sep 7, 2016
Grant date	Oct 16, 2018
Priority date	—
Expiry date	Sep 7, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70158
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination unit for lithographic exposure and a device for lithographic exposure are disclosed. In an embodiment the illumination unit includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens and a field lens.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.