Preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production
US10106657B2 · kind B2 · utility
2Cited by
8References
7Claims
0Family size
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Key dates
| Filing date | Nov 3, 2015 |
| Grant date | Oct 23, 2018 |
| Priority date | — |
| Expiry date | Apr 30, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K2003/2241
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process is provided for the preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production. Said process involves dewatering titanium dioxide particles that have been encapsulated with a layer of amorphous alumina in continuous fashion at temperatures in excess of 100° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.