Patent · US Active

Preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production

US10106657B2 · kind B2 · utility

2Cited by
8References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 3, 2015
Grant dateOct 23, 2018
Priority date
Expiry dateApr 30, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K2003/2241
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A process is provided for the preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production. Said process involves dewatering titanium dioxide particles that have been encapsulated with a layer of amorphous alumina in continuous fashion at temperatures in excess of 100° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.