Process for the generation of thin inorganic films

US10106888B2 · kind B2 · utility

Assignee

• BASF SE

Inventors

• Julia Strautmann · Mannheim, DE
• Rocco Paciello · Bad Dürkheim, DE
• Thomas Schaub · Ludwigshafen, DE
• Kerstin Schierle-Arndt · Zwingenberg, DE
• Daniel LOEFFLER · Ludwigshafen, DE
• Hagen Wilmer · Ludwigshafen, DE
• Felix Eickemeyer · Heidelberg, DE
• Florian BLASBERG · Frankfurt, DE
• Carolin Limburg · Ludwigshafen, DE

Key dates

• Filing date: Jul 24, 2015
• Grant date: Oct 23, 2018
• Expiry date: Jul 24, 2035

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45553
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process of bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.