Dual medium filter for ion and particle filtering during semiconductor processing
US10109505B2 · kind B2 · utility
1Cited by
18References
8Claims
0Family size
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Key dates
| Filing date | Feb 3, 2017 |
| Grant date | Oct 23, 2018 |
| Priority date | — |
| Expiry date | Feb 3, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.