Optical film stack with retardance layer having in-plane retardance of greater than 2.0 microns
US10114162B2 · kind B2 · utility
0Cited by
13References
23Claims
0Family size
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Key dates
| Filing date | Jan 13, 2012 |
| Grant date | Oct 30, 2018 |
| Priority date | — |
| Expiry date | Jan 13, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133634
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical film stacks are disclosed. The optical film stacks can include a first reflective polarizer, a second reflective polarizer, and a retardance layer disposed between the first reflective polarizer and the second reflective polarizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.