Method and apparatus for fixation measurement
US10117575B2 · kind B2 · utility
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2References
20Claims
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Key dates
| Filing date | Jul 22, 2015 |
| Grant date | Nov 6, 2018 |
| Priority date | — |
| Expiry date | Feb 21, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for fixation measurement includes rotating a first reflector comprising a diffraction component about a rotation axis, the first reflector being configured to reflect light received from a light source onto a second reflector via the diffraction component and reflect light received from the second reflector via the diffraction component and capturing light which is reflected by the second reflector and subsequently reflected by the first reflector with one or more photodetectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.