Stereolithography system
US10118377B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 18, 2017 |
| Grant date | Nov 6, 2018 |
| Priority date | — |
| Expiry date | Jan 18, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y30/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A stereolithography system comprises an emitting device and a tank disposed above the emitting device. The tank has a first optically transparent bottom wall and a second optically transparent bottom wall with a space disposed therebetween. There is a linear stage that extends away from the tank and a carrier platform is moveable along the linear stage away from the tank. There is also a wettable material at a bottom wall of the tank within the tank. A fluid cooling system is in fluid communication the space disposed between the first optically transparent bottom wall of the tank and the second optically transparent bottom wall of the tank.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.