Micro-optical bench device with highly/selectively-controlled optical surfaces

US10120134B2 · kind B2 · utility

Assignee

• SI-WARE SYSTEMS · EG

Inventors

• Bassam A. Saadany · Cairo, EG
• Yasser M. Sabry · Cairo, EG
• Mostafa Medhat · Cairo, EG
• Bassem Mortada · Cairo, EG
• Muhammed Nagi · Cairo, EG
• Mohamed Sadek · Cairo, EG
• Yasseen Nada · Shubra al Khayma, EG
• Khaled Shawky Hassan · Laatzen, DE

Key dates

• Filing date: Feb 18, 2016
• Grant date: Nov 6, 2018
• Expiry date: Feb 18, 2036

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81B2201/047
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.