Patent · US Active

Radiation-sensitive composition and pattern-forming method

US10120277B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignees

JSR CORPORATION · JP
Cornell University · IT

Inventors

Kazuki Kasahara · Tokyo, JP
Vasiliki Kosma · Ithaca, US
Jérémy Odent · Ithaca, US
Hong Xu · Redwood City, US
Mufei Yu · Ithaca, US
Emmanuel P. Giannelis · Ithaca, US
Christopher K. Ober · Ithaca, US

Key dates

Filing date	Feb 17, 2017
Grant date	Nov 6, 2018
Priority date	—
Expiry date	Feb 17, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/38
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.