Vapor deposition of rare earth silicate environmental barrier coatings
US10125618B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 17, 2017 |
| Grant date | Nov 13, 2018 |
| Priority date | — |
| Expiry date | Jan 17, 2037 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2300/611
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A vapor deposition method may include applying a first electron beam to vaporize a portion of a first target material comprising a rare earth oxide, where the first electron beam delivers a first amount of energy. The method also may include applying a second electron beam to vaporize a portion of a second target material comprising silica, where the second electron beam delivers a second amount of energy different from the first amount of energy. In some examples, the second target material is separate from the first target material. Additionally, the portion of the first target material and the portion of the second target material may be deposited substantially simultaneously over a substrate to form a layer over the substrate. A system for practicing vapor deposition methods and articles formed using vapor deposition methods are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.