ESD detection method for array substrate
US10126343B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2016 |
| Grant date | Nov 13, 2018 |
| Priority date | — |
| Expiry date | Dec 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G2300/0417
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides an ESD detection method for array substrate. By connecting the first metal layer on array substrate through the first wire to the first test point, connecting the second metal layer on array substrate through the second wire to the second test point, when ESD occurs on array substrate, the resistance detection device is used to measure the resistance between the first and second test points. If the resistance is positive infinity, ESD did not occur between the first and second metal layers; if the resistance is within a measurable range, ESD occurs between the first and second metal layers. The resistance is used to locate the location of ESD occurrence on array substrate. Compared to known method using microscope to search ESD location, the invention can locate ESD location on array substrate more accurately and rapidly to save time and labor as well as detection cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.