Patent · US Active

Lithographic patterning

US10126652B2 · kind B2 · utility

0Cited by
1References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2016
Grant dateNov 13, 2018
Priority date—
Expiry dateOct 1, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/40
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.