Laser system and process with buffer material
US10131016B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2015 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Apr 24, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B33/102
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A laser system includes a buffer material at an entry surface of a substrate in which laser-induced channels are formed. The laser beam propagates through the buffer material and impinges the substrate with a central axis of the laser beam at an oblique angle of incidence. The buffer material has a refractive index that may be closer to that of the substrate than is the refractive index of the atmosphere, such as air, in which the laser system operates. The buffer material facilitates forming laser-induced channels at relative large angles with respect to the substrate surface by attenuating energy loss or other effects on the laser beam that are normally caused by the mismatch in refractive index between the environment and the substrate in the absence of the buffer material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.