Laser nanomachining device and method
US10131017B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 12, 2013 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Oct 20, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/52
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
According to one aspect, the invention relates to a device (1, 2, 3) for laser nanomachining a sample made of a material having a given transparency band, the device comprising: a focusing module (203, 703) allowing a nondiffracting beam (210, 710) to be generated, along a focusing line generally oriented along the optical axis of the focusing module, from a given incident beam; first means (202, 702) for emitting a first light pulse (I1) of spectral band comprised in the transparency band of said material, able to generate in said material, after focusing by said focusing module, a plasma of free charges along said focusing line via multi-photon absorption, thus forming a “plasma channel”; and second means (202, 702) for emitting at least one second electromagnetic wave (I2) of spectral band comprised in the transparency band of said material, which wave(s) is/are intended to be spatially superposed on said plasma channel in order to heat said material via absorption by the free charges of the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.