Apparatus and method for the remote monitoring, viewing and control of a semiconductor process tool
US10132309B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2014 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Mar 4, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49236
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A precision pump system having a motor driver for accurately and repeatedly delivering process fluid, (e.g., photo chemicals) using a pumping fluid with minimal process fluid loss to a fabrication process and whereby the motor driver can be easily and quickly replaced without interrupting the fluid flow path. This is accomplished with the use of a process fluid reservoir and a pumping fluid reservoir that are associated with the pump, either integrated with the pump or closely adjacent. In addition, this precision pump system can be remotely monitored, viewed and controlled over the Internet. In addition, trapped process fluid within a downstream filtering block can be recirculated to the process fluid reservoir when trapped gas in the filter is removed. Furthermore, a nitrogen gas source is connected to the process fluid reservoir via a valve in case a need to insert a gas is required.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.