Liquid photoreactive composition and method of fabricating structures
US10133174B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2014 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Dec 31, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/103
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.