Method for manufacturing solar cell including a patterned dopant layer
US10134941B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 2016 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Jan 15, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A method for manufacturing a solar cell is disclosed. The disclosed method includes conductive region formation of forming a first-conduction-type region at one surface of a semiconductor substrate and a second-conduction-type region at another surface of the semiconductor substrate, and electrode formation of forming a first electrode connected to the first-conduction-type region and a second electrode connected to the second-conduction-type region. In the conductive region formation, the first-conduction-type region is formed by forming a dopant layer containing a first-conduction-type dopant over the one surface of the semiconductor substrate, and heat-treating the dopant layer, and the second-conduction-type region is formed by ion-implanting a second-conduction-type dopant into the semiconductor substrate at the another surface of the semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.