Patent · US Active

Doping media for the local doping of silicon wafers

US10134942B2 · kind B2 · utility

0Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 18, 2013
Grant dateNov 20, 2018
Priority date
Expiry dateOct 5, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention relates to a novel process for the preparation of printable, high-viscosity oxide media, and to the use thereof in the production of solar cells.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.