Optical device and excimer laser annealing equipment
US10135217B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Oct 27, 2017 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Oct 27, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/23
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The embodiments of the present disclosure provide an optical device and an excimer laser annealing equipment. The optical device includes: a light source; a transparent window spaced apart from the light source by a distance; and an optical system disposed between the light source and the transparent window. The transparent window is configured such that emergent light of the light source is vertically incident onto the transparent window after passing through the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.