TiN pull-back and cleaning composition
US10141181B2 · kind B2 · utility
0Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2015 |
| Grant date | Nov 27, 2018 |
| Priority date | — |
| Expiry date | May 12, 2035 |
Classification
- Technology area (CPC —)General
Abstract
The present invention relates to a novel composition that may be used to control the etching rate of TIN with respect to W, and remove any residues from the surface, e.g. organic or inorganic residues that could contain fluorine (F), which composition comprises a) an aliphatic or aromatic sulfonic acid; b) one or more inhibitor(s); c) an aprotic solvent; d) a glycol ether; and e) water. The present invention also relates to a kit comprising said composition in combination with an oxidant and optionally a stabilizer of the oxidant, and the use thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.